2025-10-26_nanoimprint-lithography-stop-saying
Canonical Target Counts
| Target | Occurrences |
|---|
| 04_knowledge_base/EUV | 17 |
| 04_knowledge_base/Semiconductor Fab | 8 |
| 04_knowledge_base/Overlay | 8 |
| 02_companies/ASML | 7 |
| 04_knowledge_base/矽晶圓 | 7 |
| 04_knowledge_base/DUV | 5 |
| 04_knowledge_base/Mask Writer | 5 |
| 04_knowledge_base/Contact | 5 |
| 04_knowledge_base/MEMS | 4 |
| 04_knowledge_base/微影製程 | 3 |
| 04_knowledge_base/Photomask | 3 |
| 04_knowledge_base/Fault tolerance | 2 |
| 04_knowledge_base/HDD | 2 |
| 04_knowledge_base/Deposition | 2 |
| 02_companies/MU | 1 |
| 04_knowledge_base/Critical Path | 1 |
| 04_knowledge_base/Self-aligned double patterning | 1 |
| 02_companies/EV Group | 1 |
| 02_companies/Kioxia | 1 |
| 04_knowledge_base/Semiconductor manufacturing | 1 |
| 04_knowledge_base/Huawei Ascend | 1 |
| 02_companies/SMIC | 1 |
| 02_companies/Huawei | 1 |
| 04_knowledge_base/Actuator | 1 |
| 04_knowledge_base/Photoresist | 1 |
| 04_knowledge_base/Post-Exposure Bake | 1 |
| 04_knowledge_base/Feature Size | 1 |
| 04_knowledge_base/5nm | 1 |