2023-02-27_embracing-chaos-the-imperfect-art
Canonical Target Counts
| Target | Occurrences |
|---|
| 04_knowledge_base/EUV | 19 |
| 04_knowledge_base/Semiconductor Fab | 12 |
| 04_knowledge_base/微影製程 | 10 |
| 02_companies/KLAC | 8 |
| 04_knowledge_base/Photomask | 8 |
| 04_knowledge_base/Photoresist | 7 |
| 02_companies/LRCX | 6 |
| 02_companies/INTC | 5 |
| 04_knowledge_base/Contact | 5 |
| 04_knowledge_base/矽晶圓 | 5 |
| 02_companies/2330 台積電 | 4 |
| 04_knowledge_base/Transistor | 4 |
| 04_knowledge_base/TSMC N5 | 2 |
| 02_companies/ASML | 2 |
| 04_knowledge_base/2nm | 2 |
| 04_knowledge_base/Via | 2 |
| 04_knowledge_base/Deposition | 2 |
| 04_knowledge_base/Dry Resist | 2 |
| 04_knowledge_base/Stochastic Defect | 2 |
| 04_knowledge_base/Metal Oxide Resist | 2 |
| 04_knowledge_base/Pellicle | 2 |
| 04_knowledge_base/Overlay | 2 |
| 04_knowledge_base/SiGe | 1 |
| 04_knowledge_base/Line-edge roughness | 1 |
| 04_knowledge_base/Semiconductor manufacturing | 1 |
| 04_knowledge_base/封裝 | 1 |
| 02_companies/Aligned Data Centers | 1 |
| 02_companies/Sumitomo | 1 |
| 02_companies/Switch | 1 |
| 04_knowledge_base/H100 | 1 |
| 04_knowledge_base/DUV | 1 |
| 02_companies/NVDA | 1 |
| 02_companies/Tokyo Ohka Kogyo | 1 |
| 02_companies/000660 | 1 |
| 04_knowledge_base/Local Edge Placement Error | 1 |
| 04_knowledge_base/Local Critical Dimension Uniformity | 1 |
| 04_knowledge_base/Gate-All-Around | 1 |
| 04_knowledge_base/A100 | 1 |
| 04_knowledge_base/Optical Critical Dimension | 1 |
| 04_knowledge_base/Process node | 1 |
| 04_knowledge_base/3nm | 1 |
| 04_knowledge_base/Design for Test | 1 |
| 04_knowledge_base/Meteor Lake | 1 |
| 04_knowledge_base/GPU | 1 |