2023-02-02_iedm2022p1

  • Source: 2023-02-02_iedm2022p1
  • Link occurrences: 340
  • Canonical targets: 99
  • Missing targets: 0
  • Audit batches: 202608112133330800, 202608120125230800

Canonical Target Counts

TargetOccurrences
02_companies/2330 台積電39
02_companies/INTC22
04_knowledge_base/封裝22
04_knowledge_base/Contact14
04_knowledge_base/TSMC N3E11
04_knowledge_base/SRAM10
04_knowledge_base/CFET9
04_knowledge_base/Transistor9
02_companies/IBM8
04_knowledge_base/DTCO8
04_knowledge_base/FoCoS8
04_knowledge_base/CoWoS6
04_knowledge_base/Hybrid Bonding6
02_companies/AMD6
04_knowledge_base/HBM6
04_knowledge_base/FinFLEX6
02_companies/Applied Materials5
04_knowledge_base/Tungsten5
02_companies/QCOM5
04_knowledge_base/Interconnect Stack5
04_knowledge_base/FO-EB5
04_knowledge_base/Microbumps4
04_knowledge_base/Line Space4
04_knowledge_base/Copper3
02_companies/3037 欣興3
02_companies/imec3
04_knowledge_base/EUV3
04_knowledge_base/基板3
04_knowledge_base/Foveros Direct3
04_knowledge_base/Thermal Compression Bonding3
02_companies/Together AI3
04_knowledge_base/Ruthenium3
02_companies/Aligned Data Centers3
04_knowledge_base/PMOS3
04_knowledge_base/LFET3
04_knowledge_base/NMOS3
04_knowledge_base/ABF2
04_knowledge_base/GPU2
04_knowledge_base/RDL2
04_knowledge_base/Microsoft Cobalt2
04_knowledge_base/Sapphire Rapids2
04_knowledge_base/ASIC2
04_knowledge_base/Leading-Edge Node2
04_knowledge_base/FinFET2
04_knowledge_base/Reticle2
04_knowledge_base/Standard cell2
04_knowledge_base/Vertical Transport FET2
04_knowledge_base/Metal pitch2
04_knowledge_base/CPU2
04_knowledge_base/FOCoS-CF2
04_knowledge_base/FOCoS-CL2
04_knowledge_base/Interposer1
04_knowledge_base/SoIC1
02_companies/TXN1
04_knowledge_base/Nanosheet1
02_companies/MU1
04_knowledge_base/Intel EMIB1
04_knowledge_base/Contacted Gate Pitch1
04_knowledge_base/SiGe1
04_knowledge_base/MI3001
02_companies/SPIL1
02_companies/Baidu1
04_knowledge_base/NAND Flash1
04_knowledge_base/Chiplet architecture1
04_knowledge_base/InFO1
04_knowledge_base/Foveros1
04_knowledge_base/Chemical Vapor Deposition (CVD)1
04_knowledge_base/FPGA1
04_knowledge_base/Silicon bridge1
04_knowledge_base/HBM31
02_companies/LRCX1
04_knowledge_base/Organic interposer1
04_knowledge_base/Damascene process1
02_companies/0006601
04_knowledge_base/Double Patterning1
04_knowledge_base/Mobile SoC1
04_knowledge_base/Deposition1
04_knowledge_base/14nm1
04_knowledge_base/Logic Process1
04_knowledge_base/Wafer bonding1
04_knowledge_base/Semiconductor Fab1
04_knowledge_base/Zen 31
04_knowledge_base/Process node1
04_knowledge_base/High Aspect Ratio1
04_knowledge_base/Via1
04_knowledge_base/Backside Power Delivery1
04_knowledge_base/FOCoS-B1
04_knowledge_base/I-Cube1
04_knowledge_base/3nm1
04_knowledge_base/Wafer-to-Wafer Bonding1
04_knowledge_base/TCAD1
04_knowledge_base/AMD Instinct MI250X1
04_knowledge_base/3D V-Cache1
04_knowledge_base/TSMC N51
04_knowledge_base/Overlay1
03_industries/Foundry1
04_knowledge_base/Reconstituted wafer1
04_knowledge_base/5nm1
04_knowledge_base/7nm1