Canonical Target Counts
| Target | Occurrences |
|---|
| 04_knowledge_base/Laser Anneal | 9 |
| 04_knowledge_base/MOCVD | 8 |
| 04_knowledge_base/EUV | 6 |
| 04_knowledge_base/封裝 | 5 |
| 04_knowledge_base/Deposition | 5 |
| 04_knowledge_base/微影製程 | 4 |
| 04_knowledge_base/矽晶圓 | 4 |
| 04_knowledge_base/Micro-LED | 4 |
| 02_companies/AMEC | 3 |
| 04_knowledge_base/HBM | 3 |
| 02_companies/LRCX | 2 |
| 02_companies/INTC | 2 |
| 04_knowledge_base/NAND Flash | 2 |
| 02_companies/2330 台積電 | 2 |
| 02_companies/ASML | 2 |
| 04_knowledge_base/Ruthenium | 2 |
| 04_knowledge_base/Annealing | 2 |
| 04_knowledge_base/Wafer cleaning | 2 |
| 04_knowledge_base/200mm Wafer | 2 |
| 03_industries/WFE | 2 |
| 04_knowledge_base/Gate-All-Around | 2 |
| 02_companies/6501.T | 1 |
| 04_knowledge_base/Copper | 1 |
| 04_knowledge_base/FoCoS | 1 |
| 04_knowledge_base/Silicon carbide | 1 |
| 04_knowledge_base/Chemical Vapor Deposition (CVD) | 1 |
| 04_knowledge_base/Tungsten | 1 |
| 02_companies/KLAC | 1 |
| 04_knowledge_base/Foveros | 1 |
| 02_companies/Applied Materials | 1 |
| 04_knowledge_base/Molybdenum | 1 |
| 04_knowledge_base/CoWoS | 1 |
| 04_knowledge_base/InFO | 1 |
| 04_knowledge_base/DRAM | 1 |
| 02_companies/MU | 1 |
| 04_knowledge_base/Actuator | 1 |
| 04_knowledge_base/3nm | 1 |